Nanolithography: a Borderland Between Stm, Eb, Ib, and X-ray Lithographies - Nato Science Series E:

Marc Notes: Proceedings of the NATO Advanced Research Workshop on Nanolithography: a Borderland Between STM, EB, IB, and X-Ray Lithographies, Frascati, Roma, Italy, April 6-8, 1993--T.p. verso.; Published in cooperation with NATO Scientific Affairs Division.; Includes bibliographical references and indexes. Table of Contents: Preface. Electron Beam Lithography. Nanolithography, the Integrated System; F. J. Hohn. Electron Beam Resists and Pattern Transfer Methods; M. Hatzakis. Nanolithography developed through Electron-Beam-Induced Surface Reaction; S. Matsui, Y. Ochiai, M. Baba, H. Watanabe. Direct Writing of Nanoscale Patterns in SiO2; X. Pan, A. N. Broers. Sub-10 nm Electron Beam Lithography: -AIF-Doped Lithium Fluoride as a Resist; W. Langheinrich, H. Beneking. Surface Imaging for EB-Nanolithography; M. Bottcher, L. Bauch, A. Wolff, W. Hoppner. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier; A. Schmidt, F. Faller, A. Forchel. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching; P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski. Fabrication, Investigation and Manipulation of Artificial Nanostructures; A. Menschig, F. E. Prins, G. Lehr, R. Bergmann, J. Hommel, U. A. Griesinger, V. Harle, F. Scholz, H. Schweizer. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition; H. W. P. Koops, M. Rudolph, J. Kretz, M. Weber. Nanolithography Requirements -- an Equipment Manufacturer's View; B. A. Wallman, G. Crawley. X-Ray Lithography. X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing; H. I. Smith, M. L. Schattenburg. X-Ray Phase Shifting Masks; F. Cerrina, J. Xiao, Z. Y. Guo. Fabrication of X-Ray Mask for Nanolithography by EBL; M. Gentili. Ion Beam Lithography. Intense Focused Ion Beams for Nanostructurisation; S. Kalbitzer, Ch. Wilbertz, Th. Miller. Latest Results Obtained with the Alpha IonProjection Machine; W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl, F. Thalinger, H. Loschner, G. Stengl, P. Hudek. STM Lithography. Direct Writing with a Combined STM/SEM System; A. L. de Lozanne, W. F. Smith, E. E. Ehrichs. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope; C. R. K. Marrian, F. K. Perkins, S. L. Brandow, T. S. Koloski, E. A. Dobisz, J. M. Calvert. STM Nanolithography and Characterization of Passivated Silicon and Gallium Arsenide; J. A. Dagata. Sub-20 nm Lithographic Patterning with the STM; L. Stockman, C. Van Haesendonck, G. Neuttiens, Y. Bruynseraede. Lithography of YBa2Cu3O7 Superconducting Thin Films with a Scanning Tunneling Microscope; I. Heyvaert, E. Osquiguil, C. Van Haesendonck, Y. Bruynseraede. Author Index. Subject Index."Publisher Marketing: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, and so on. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.