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High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1st edition
High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1st edition
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).
246 pages, 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
Media | Books Hardcover Book (Book with hard spine and cover) |
Released | December 18, 2020 |
ISBN13 | 9781771888431 |
Publishers | Apple Academic Press Inc. |
Pages | 264 |
Dimensions | 650 g |
Language | English |
Editor | Baishya, Srimanta (National Institute of Technology, India) |
Editor | Maity, Reshmi (Mizoram University, India) |
Editor | Pratap Maity, Niladri (Mizoram University, India) |